Titanium Silicon Carbide

Titanium silicon carbide is used as a sputtering target material to deposit MAX phase thin films that provide high-temperature oxidation resistance and metallic-like conductivity for electronic components.

As a MAX phase ceramic, Ti3SiC2 is utilized for high-temperature structural components due to its unique combination of metallic ductility and ceramic heat resistance.

Used in the production of refractory parts that require high thermal shock resistance and damage tolerance in extreme environments.