Thulium Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.125 inch th.

Thulium oxide is utilized as a dopant in laser materials and as a precursor for producing high-purity thulium metal and other specialized rare earth compounds.

Thulium oxide is fabricated into high-purity sputtering targets for the deposition of thin films used in optical and electronic device manufacturing.

Used as a material for thin-film optical coatings to modify the refractive index and absorption characteristics of glass and specialized lenses.

Thulium oxide serves as a source material for physical vapor deposition processes to create functional coatings in vacuum systems.