Chemical Name
Vanadium Silicide
Chemical Formula
V3Si
Purity
99.95%
Composition
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
12039-76-8
Status
Product ID
SPV3SI2D6T3N5
Hazmat
Catalog Number
3596
Description
Comments
Vanadium silicide is utilized as a sputtering target material for the deposition of thin films in microelectronics and superconducting device fabrication.
Used in the formation of ohmic contacts and interconnects within semiconductor devices due to its high thermal stability and low electrical resistivity.
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