Vanadium Aluminum Copper Alloy, Sputtering Target, 99.99%, 329.69 mm dia x 3 mm th.

Vanadium-aluminum-copper alloy targets are used in physical vapor deposition to create thin films with specific electrical and corrosion-resistant properties for microelectronic and decorative coatings.

Used as a master alloy in the production of titanium alloys and high-strength aerospace materials to improve mechanical properties and thermal stability.