Chemical Name
Vanadium Silicide
Chemical Formula
VSi2
Purity
99.5%
Composition
Size
4 inch dia x 0.25 inch th.
EINECS Number
234-908-5
Quantity Available
pcs
CAS Number
12039-87-1
Status
Product ID
SPVSI24D6T2N5
Hazmat
Catalog Number
5943
Description
Comments
Vanadium silicide is used as a sputtering target material to create thin films for microelectronic components and integrated circuits, providing stable ohmic contacts and interconnects.
Used in semiconductor manufacturing for the formation of silicide layers that act as low-resistance contact materials and gate electrodes in MOS devices.
Due to its high melting point and chemical stability, it is utilized in refractory applications requiring resistance to oxidation and high-temperature environments.
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