Vanadium Tungsten, Sputtering Target, 99.9%, 6 inch dia x 4 mm th.

Vanadium-tungsten alloy targets are utilized in magnetron sputtering processes to create thin films that serve as diffusion barriers or adhesion layers in microelectronic devices.

Vanadium and tungsten are combined to produce high-strength, heat-resistant alloys used in aerospace and tool steel applications to enhance hardness and thermal stability.

Due to the high melting points of both constituent metals, vanadium-tungsten compositions are employed in the production of refractory components capable of withstanding extreme thermal environments.