Tungsten - Nickel (90:10), Sputtering Target, 99.95%, 8 inch dia x 0.25 inch th.

Tungsten-Nickel alloys are used as sputtering targets to create thin films for microelectronic components and diffusion barriers due to their high density and thermal stability.

Used as a master alloy or additive in the production of heavy metal alloys where nickel acts as a binder to improve the ductility and machinability of tungsten.

Utilized in physical vapor deposition processes to deposit tungsten-containing layers with modified mechanical properties provided by the nickel content.