Tungsten Oxide, Sputtering Target, 99.95%, 3 inch dia x 0.125 inch th.

Tungsten oxide is used as a sputtering target material to create thin films for electrochromic windows and gas sensors.

Applied via vacuum deposition to create thin films with specific refractive indices for optical filters and smart glass applications.

Used as a source material in thermal or e-beam evaporation processes to deposit functional metal oxide layers.

Synthesized into nanostructures like nanowires or nanoparticles for enhanced photocatalytic and sensing performance.

Investigated as an intercalation host or conversion-type electrode material to improve capacity and stability in lithium-ion systems.

Acts as an n-type semiconductor in various electronic devices, particularly in gas sensing and photoelectrochemical cells.