Tungsten Rhenium Alloy, Sputtering Target, 99.95%, 3 inch dia x 0.125 inch th.

Tungsten-rhenium alloy targets are used in physical vapor deposition to create thin films for semiconductor diffusion barriers and high-temperature sensors.

Rhenium is added to tungsten to improve ductility, increase recrystallization temperature, and enhance high-temperature strength for aerospace and nuclear components.

Used in the construction of high-temperature furnace components, thermocouples, and X-ray anodes due to its exceptional heat resistance.

W-Re alloys maintain structural integrity and resistance to thermal shock in extreme environments exceeding 2000 °C.

Utilized as a source material in vacuum evaporation processes for depositing durable, heat-resistant metallic coatings.