Yttrium Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.125 inch th.

Used as a starting material for the synthesis of other yttrium compounds and as a stabilizing agent in zirconia ceramics.

Utilized as a high-purity sputtering target material for the deposition of thin films in optical and semiconductor applications.

Applied as a high-refractive index layer in multilayer optical coatings due to its transparency from UV to IR wavelengths.

Used in plasma spray coating processes to provide thermal insulation and corrosion resistance for aerospace and industrial gas turbine components.

Employed as a source material in physical vapor deposition processes to create protective and functional dielectric layers.