Yttrium Iron Alloy, Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Yttrium Iron alloy targets are used in magnetron sputtering processes to deposit magnetic thin films for magneto-optical storage and microwave device components.

Utilized as a precursor material in the synthesis of yttrium iron garnets (YIG) for advanced microwave and optical communication technologies.