Ytterbium Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.25 inch th.

Used as a dopant in glass and optical fibers to enhance laser performance and as a precursor for other ytterbium compounds.

Utilized as a high-purity sputtering target material for the deposition of thin films in electronic and optical device fabrication.

Applied as a thin film coating for lenses and mirrors due to its high refractive index and transparency in the infrared spectrum.

Used as a source material in physical vapor deposition processes to create protective or functional dielectric layers.