Ytterbium Fluoride, Sputtering Target, 99.995%, 3 inch dia x 0.25 inch th.

Used as a precursor for producing metallic ytterbium and in the formulation of specialized fluoride glasses and ceramics.

Applied as a low-refractive index material in multilayer optical coatings, particularly for applications in the infrared spectrum.

Utilized as a high-purity sputtering target material for the deposition of thin films in optical and electronic device fabrication.

Used as a source material for physical vapor deposition to create thin fluoride layers with high transparency and durability.