Yttrium Manganate (Yttrium Manganese Oxide), Sputtering Target, 99.9%, 2 inch dia x 0.250 inch th.

Yttrium Manganate is utilized as a sputtering target material for the deposition of multiferroic thin films in electronic and memory device research.

Used in the development of advanced optoelectronic devices due to its unique ferroelectric and antiferromagnetic properties.