Chemical Name
Yttrium Silicide
Chemical Formula
YSi2
Purity
99.9%
Composition
Size
3 inch dia x 0.250 inch th.
EINECS Number
235-080-8
Quantity Available
pcs
CAS Number
12067-55-9
Status
Product ID
SPYSI23D6T03N
Hazmat
Catalog Number
3483
Description
Comments
Yttrium silicide is used as a sputtering target material for the deposition of thin films in microelectronics and semiconductor research, particularly for forming ohmic contacts or Schottky barriers.
YSi2 is utilized in semiconductor technology for the creation of epitaxial silicide layers on silicon substrates due to its low Schottky barrier height on n-type silicon.
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