Yttrium Silicide, Sputtering Target, 99.9%, 3 inch dia x 0.250 inch th.

Yttrium silicide is used as a sputtering target material for the deposition of thin films in microelectronics and semiconductor research, particularly for forming ohmic contacts or Schottky barriers.

YSi2 is utilized in semiconductor technology for the creation of epitaxial silicide layers on silicon substrates due to its low Schottky barrier height on n-type silicon.