Zinc Fluoride, Sputtering Target, 99.99%, 3 inch dia x 3 mm th.

Zinc fluoride is used as a low-refractive index material in the fabrication of multi-layered optical coatings and specialized glass to enhance transparency and reduce reflection.

Zinc fluoride is utilized as a high-purity sputtering target material for the deposition of thin films in electronic and optical device manufacturing.

It is employed as an evaporation source material in physical vapor deposition processes to create thin fluoride layers for protective or functional coatings.