Zinc Gallium Metal Alloy, Sputtering Target, 99.99%, 13 inch dia x 8 mm th.

Zinc Gallium alloy targets are used in magnetron sputtering processes to deposit thin films for the fabrication of transparent conductive oxides (TCOs) and semiconductor layers.

Used as a precursor or dopant source in the growth of wide-bandgap semiconductor materials and for creating ohmic contacts in gallium-based electronic devices.

Utilized as a source material in physical vapor deposition (PVD) to create specific alloy coatings for optoelectronic applications.