Zinc oxide-Gallium oxide, Sputtering Target, 99.99%, MRC (4.75 inch x 14.875 inch x 0.250 inch th.)

Zinc oxide-Gallium oxide (GZO) targets are used in magnetron sputtering to deposit transparent conductive oxide (TCO) thin films as an alternative to ITO.

Used as a transparent electrode material in liquid crystal displays, organic light-emitting diodes (OLEDs), and thin-film solar cells.

Acts as an n-type semiconductor material for thin-film transistors and ultraviolet photodetectors.

Applied as a functional optical coating to manage light transmission and electrical conductivity in architectural glass and display panels.