Zinc Oxide, Sputtering Target, 99.99%, 203.2 mm dia x 6.35 mm th.

Zinc oxide is used as a wide-bandgap semiconductor for the fabrication of blue/UV light-emitting diodes and transparent conductive oxides.

ZnO is utilized in thin-film transistors and varistors due to its high electron mobility and tunable electrical properties.

Zinc oxide targets are used in magnetron sputtering processes to deposit transparent conductive films (TCO) for solar cells and display panels.

Applied as a thin film via vacuum deposition to provide anti-reflective properties and UV protection in precision optical components.

Produced in various morphologies such as nanowires, nanorods, and nanoparticles for use in chemical sensors and photocatalysis.