Zinc Oxide (Ga doped), Sputtering Target, 99.99%, 18 inch dia x .035 inch th.

Gallium-doped Zinc Oxide (GZO) targets are used in magnetron sputtering to deposit transparent conductive oxide (TCO) thin films as an alternative to ITO.

Used in the fabrication of transparent electrodes for liquid crystal displays, organic light-emitting diodes (OLEDs), and thin-film solar cells.

Acts as an n-type semiconductor material with high carrier concentration and mobility for use in transparent thin-film transistors.

Applied as a functional coating to manage light transmission and electrical conductivity in architectural glass and optoelectronic devices.