Zinc Oxide (Ga doped), Sputtering Target, 99.99%, 1 inch dia x 0.25 inch th.

Gallium-doped Zinc Oxide (GZO) targets are used in magnetron sputtering to deposit transparent conductive oxide (TCO) thin films as an alternative to ITO.

Used in the fabrication of transparent electrodes for liquid crystal displays, organic light-emitting diodes (OLEDs), and solar cells due to its high optical transparency and electrical conductivity.

Acts as an n-type semiconductor material for thin-film transistors and other microelectronic components requiring wide bandgap characteristics.