Zinc Oxide Indium, Sputtering Target, 99.99%, 2 inch dia x 0.25 inch th.

Zinc Oxide Indium (IZO) is utilized as a high-purity sputtering target material for the deposition of transparent conductive oxide (TCO) thin films in flat panel displays and solar cells.

Used as a wide-bandgap semiconductor material for thin-film transistors (TFTs) due to its high electron mobility and excellent chemical stability compared to amorphous silicon.

Applied in the fabrication of transparent electrodes for LEDs and organic photovoltaics where high optical transparency and electrical conductivity are required.