Zinc Tin Oxide, Sputtering Target, 99.99%, 3 inch dia x 0.125 inch th.

Zinc Tin Oxide is utilized as a sputtering target material to deposit transparent conductive oxide (TCO) thin films and buffer layers in thin-film solar cells and flat panel displays.

ZTO serves as an n-type amorphous oxide semiconductor used in the fabrication of thin-film transistors (TFTs) due to its high electron mobility and optical transparency.

Used in optoelectronic devices as a transparent electrode material that offers a tunable bandgap and high transparency in the visible spectrum.