Zinc Silicon Oxide, Sputtering Target, 99.999%, 2 inch dia x 0.25 inch th.

Zinc silicon oxide is utilized as a sputtering target material to create transparent conductive oxide (TCO) films and dielectric layers in thin-film transistor and display technologies.

Used as a high-refractive index material in multilayer optical coatings to provide anti-reflective properties and environmental protection for glass and plastic substrates.

Applied as a wide-bandgap semiconductor material or gate dielectric in thin-film transistors (TFTs) for next-generation flexible electronics.