Zinc Silicon Oxide, Sputtering Target, 99.999%, 2 inch dia x 0.25 inch th.

Zinc silicon oxide is utilized as a sputtering target material to create transparent conductive oxide (TCO) films and dielectric layers in thin-film transistor and solar cell applications.

Used as a high-refractive index material in multilayer optical coatings to provide specific reflective or anti-reflective properties in the visible and infrared spectrums.

Investigated as a wide-bandgap semiconductor material for use in thin-film transistors (TFTs) and as a passivation layer in electronic devices.