Zinc Sulfide-Silicon dioxide, Sputtering Target, 99.99%, 101 mm dia x 5.8 mm th.

ZnS-SiO2 is widely used as a sputtering target material for the dielectric protective layer in phase-change optical discs (CD-RW, DVD-RAM) and heat-resistant layers in thin-film applications.

Used as a high-refractive index dielectric material for interference filters and protective coatings due to its excellent transparency and thermal stability.

Utilized in physical vapor deposition processes to create thin films with specific refractive indices and mechanical durability.