Zirconium Oxide- Silicon Dioxide

Used as a sputtering target material to deposit composite thin films with controlled refractive indices and high chemical durability.

Applied via physical vapor deposition to create interference filters and antireflective coatings with high laser damage thresholds.

Utilized in plasma spray processes to create thermal barrier coatings and wear-resistant surfaces on industrial components.

Employed in the production of high-temperature ceramics and glazes due to its excellent thermal stability and resistance to chemical corrosion.