Zirconium Yttrium Gadolinium Lanthanum Hafnium alloy, Sputtering Target, 99.9%, 440 mm x 100 mm x 8 mm th.

Used as a high-entropy alloy sputtering target to deposit complex multi-element thin films for corrosion resistance and diffusion barriers.

Serves as a base for developing high-entropy alloys (HEAs) with unique mechanical properties and high-temperature stability.

Investigated for use in extreme environments due to the sluggish diffusion and high thermal stability characteristic of multi-component lanthanide-transition metal alloys.