Hafnium Oxide:Titanium Dioxide [LPF-1], Pellets, 99.95%, 10 mm dia x 10 mm th.

Hafnium Oxide:Titanium Dioxide composite targets are used in magnetron sputtering to deposit high-refractive index, low-absorption thin films for complex multilayer interference coatings.

This mixed oxide material is utilized to create thin films with tailored refractive indices and high laser-induced damage thresholds for precision optical components.

HfO2:TiO2 is employed as an evaporation source material in physical vapor deposition processes to produce stable, dense dielectric layers for optical and microelectronic applications.