Lanthanum Titanate (Lanthanum Titanium Oxide), Window/Blank, 99.9%, 20 mm w. tol: +- .1 mm x 20 mm ln. tol: +- .1 mm x 1 mm thick. tol: +- .05 mm

Lanthanum titanate is used as a sputtering target material for the deposition of high-dielectric constant (high-k) thin films in electronic components.

Utilized in vacuum deposition processes to create optical thin films with specific refractive index properties for interference filters and mirrors.

Investigated for use in semiconductor gate dielectrics and as a substrate material for epitaxial growth of other perovskite oxides.