Zinc Sulfide Silicon Oxide - Copper doped, Sputtering Target, 99.95%, 8 inch dia x 0.250 inch th.

Used as a sputtering target material for the deposition of thin films in electroluminescent displays and optical storage media, where the copper dopant acts as a luminescent activator.

Utilized in the fabrication of thin-film electroluminescent (TFEL) devices and phosphor layers due to its tunable optical properties and efficient light emission.