Hafnium , Crystal Bar kg, 99.995%, 1 mm dia. x 4 mm th.

Hafnium sputtering targets are used to deposit thin films for high-k dielectric layers and protective coatings in microelectronic devices.

Hafnium is utilized in the fabrication of high-k gate dielectrics, such as hafnium dioxide, to reduce leakage current in advanced integrated circuits.

Hafnium is added to nickel-based superalloys to improve grain boundary strength and oxidation resistance in high-temperature aerospace components.

High-purity hafnium pellets and wire are used as evaporation sources for the deposition of optical and protective thin films.

Due to its high melting point and corrosion resistance, hafnium is used in specialized refractory applications and nuclear control rods.