Chemical Name
Cobalt Silicide
Chemical Formula
CoSi2
Purity
99.5%
Composition
D10=1.42, D50=3.262, D90=6.50 mic
Size
-1250 mesh approx
EINECS Number
234-616-8
Quantity Available
kg
CAS Number
12017-12-8
Status
Product ID
COSI2PO841602
Hazmat
Not hazardous for transportation
Catalog Number
20235
Description
Comments
inred SSA:843.1m^2/kg
Cobalt silicide is widely used as a contact material and for interconnects in CMOS technology due to its low electrical resistivity and high thermal stability.
Cobalt silicide targets are utilized in physical vapor deposition processes to create thin films for microelectronic gate electrodes and local wiring.
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