Chromium (III) Silicide, Powder, 99.5%, -325 mesh approx

Chromium (III) Silicide is used as a sputtering target material to create thin films for microelectronics and wear-resistant coatings.

Used in the fabrication of thin-film resistors and integrated circuits due to its stable electrical properties and high-temperature resistance.

Utilized in high-temperature applications requiring oxidation resistance and structural stability at elevated temperatures.