Barium Hafnium Oxide, Pieces, 99.95%, 3 -6 mm

Barium Hafnium Oxide is used as a sputtering target material to create high-k dielectric thin films and as an artificial pinning center in high-temperature superconducting films.

Utilized in the deposition of optical thin films due to its high refractive index and wide bandgap, providing stability in multilayer interference coatings.

Due to its exceptionally high melting point and chemical stability, it is employed in specialized refractory applications and high-temperature ceramic components.