Chemical Name
Hafnium
Chemical Formula
Hf
Purity
99.9%
Composition
Hf+Zr >99.9%, Zr<0.5%
Size
3 mm -12 mm
EINECS Number
231-166-4
Quantity Available
kg
CAS Number
7440-58-6
Status
25 kg
Product ID
GRHF31200003N
Hazmat
Powder: Class 4.2, UN2545, PG II
Catalog Number
15084
Description
Comments
Contact for spot price Come in the forms of pcs, granules or turning
Hafnium sputtering targets are used to deposit thin films for high-k dielectric layers and protective coatings in microelectronic devices.
Hafnium is utilized in the fabrication of high-k gate dielectrics, such as hafnium dioxide, to reduce leakage current in advanced integrated circuits.
Hafnium is added to nickel-based superalloys to improve grain boundary strength and oxidation resistance in high-temperature aerospace components.
High-purity hafnium pellets and wire are used as evaporation sources for the deposition of optical and protective thin films.
Due to its high melting point and corrosion resistance, hafnium is used in specialized refractory applications and nuclear control rods.
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