Chemical Name
Ruthenium Silicide
Chemical Formula
Ru2Si3
Purity
99.95%
Composition
Size
3 mm -6 mm
EINECS Number
Quantity Available
kg
CAS Number
Status
Product ID
GRRU2SI3363N5
Hazmat
Catalog Number
10235
Description
Comments
Ruthenium silicide is utilized as a high-temperature semiconducting material and in the formation of ohmic contacts or Schottky barriers in microelectronic devices.
Used as a sputtering target material to deposit thin films for microelectronic components and protective coatings requiring high thermal stability.
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