Yttrium Oxyfluoride, Granules, 99.9%, < 5 mm

Yttrium oxyfluoride is used as a sputtering target material to create plasma-resistant coatings for semiconductor processing equipment components.

Applied via atmospheric plasma spray to provide high-performance erosion and corrosion resistance in halogen-based plasma environments.

Utilized in thin-film deposition to produce protective layers with specific refractive indices and high transparency in the UV to IR range.

Used as a high-purity coating material for chamber parts to prevent particle contamination during etching and deposition processes.