Chemical Name
Hafnium
Chemical Formula
Hf
Purity
99.9%
Composition
Zr<0.12%, D10=23, D50=30, D90=42 mic
Size
-325 +625 mesh
EINECS Number
231-166-4
Quantity Available
kg
CAS Number
7440-58-6
Status
Product ID
POHF32500003N
Hazmat
Powder: Class 4.2, UN2545, PG II
Catalog Number
15049
Description
Comments
inred Packed dry in 500g and 1000g epoxy coated liner Aluminum can. Condensation of moisture may be present
Hafnium sputtering targets are used to deposit thin films for high-k dielectric layers and protective coatings in microelectronic devices.
Hafnium is utilized in the fabrication of high-k gate dielectrics, such as hafnium dioxide, to reduce leakage current in advanced integrated circuits.
Hafnium is added to nickel-based superalloys to improve grain boundary strength and oxidation resistance in high-temperature aerospace components.
High-purity hafnium pellets and wire are used as evaporation sources for the deposition of optical and protective thin films.
Due to its high melting point and corrosion resistance, hafnium is used in specialized refractory applications and nuclear control rods.
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