Chemical Name
Hafnium Boride
Chemical Formula
HfB2
Purity
99.5%
Composition
Zr<0.16 wt%
Size
-2400 mesh ( 2 mic aps) approx
EINECS Number
234-500-7
Quantity Available
kg
CAS Number
12007-23-7
Status
Product ID
POHFB224002N5
Hazmat
Not hazardous for transportation
Catalog Number
16950
Description
Comments
inred GDMS available upon request PSD (D10=0.811, D50=1.88, D90=3.28 mic)
Hafnium boride is used as a sputtering target material to create ultra-high temperature ceramic thin films and wear-resistant coatings in microelectronics and aerospace components.
As an ultra-high temperature ceramic (UHTC), hafnium diboride is utilized in the fabrication of components that must maintain structural integrity at temperatures exceeding 2000 °C.
Used in the development of thermal protection systems and propulsion components due to its exceptional thermal stability and resistance to oxidation at extreme temperatures.
Hafnium boride serves as a source material in physical vapor deposition processes to deposit hard, chemically inert protective layers.
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