Hafnium Nitride, Powder, 99.5%, -425 mesh (10.8 mic aps)

Hafnium nitride is used as a sputtering target material to create hard, wear-resistant coatings and diffusion barriers in microelectronic devices.

Used in the semiconductor industry as a high-stability diffusion barrier and as a gate electrode material due to its high thermal stability and suitable work function.

Utilized for its exceptionally high melting point and mechanical hardness in high-temperature structural components and cutting tools.

Applied via physical vapor deposition to create durable optical thin films with specific refractive index requirements.