Chemical Name
Molybdenum Silicide
Chemical Formula
MoSi2
Purity
99.8%
Composition
Size
-1250 mesh (2.1 mic aps) approx
EINECS Number
235-231-8
Quantity Available
kg
CAS Number
12136-78-6
Status
Product ID
POMOSI212502N8
Hazmat
Catalog Number
259
Description
Comments
inred PSD report available on request, D10-0.69, D50-2.16, D90-5.07
Molybdenum silicide is used as a sputtering target material to deposit thin films that serve as oxidation-resistant coatings and conductive interconnects in microelectronics.
MoSi2 is utilized as a high-grade refractory material for heating elements due to its ability to form a protective silica layer at high temperatures.
It is employed in high-temperature structural components and furnace elements that operate in oxidizing atmospheres up to 1700°C.
Used in the semiconductor industry for the formation of ohmic contacts and gate electrodes due to its high thermal stability and low resistivity.
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