Chemical Name
Molybdenum Silicide
Chemical Formula
MoSi2
Purity
99.5%
Composition
Size
-80 +200 mesh (127 mic aps)
EINECS Number
235-231-8
Quantity Available
kg
CAS Number
12136-78-6
Status
Product ID
POMOSI28002N5
Hazmat
Catalog Number
932
Description
Comments
inred PSD available upon request, D10=74.79, D50=127.2, D90=175.2
Molybdenum silicide is used as a sputtering target material to deposit thin films that serve as oxidation-resistant coatings and conductive interconnects in microelectronics.
MoSi2 is utilized as a high-grade refractory material for heating elements due to its ability to form a protective silica layer at high temperatures.
It is employed in high-temperature structural components and furnace elements that operate in oxidizing atmospheres up to 1700°C.
Used in the semiconductor industry for the formation of ohmic contacts and gate electrodes due to its high thermal stability and low resistivity.
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