Chemical Name
Tantalum Silicide
Chemical Formula
TaSi2
Purity
99.5%
Composition
Size
-325 mesh (17.3 mic aps) approx
EINECS Number
234-902-2
Quantity Available
kg
CAS Number
12039-79-1
Status
Product ID
POTASI23252N5
Hazmat
Catalog Number
657
Description
Comments
ceramic grade
Used as a conductive material for gates and interconnects in integrated circuits due to its high temperature stability and low resistivity.
Fabricated into sputtering targets for the deposition of thin films used in microelectronics and protective coatings.
Utilized in high-temperature environments due to its excellent oxidation resistance and high melting point.
Loading COA files…