Tantalum Tungsten
PowderChemical Name
Chemical Formula
Purity
99.5%
Composition
97.5/2.5 wt% Ta:W
Size
20 -45 micron
EINECS Number
Quantity Available
kg
CAS Number
Status
Product ID
POTAW204502N5
Hazmat
Sputtering target: HazMat: UN3288 Powder: UN3288
Catalog Number
17088
Description
Comments
inred MOQ 5 kg
Tantalum-tungsten alloys are used as sputtering targets to deposit thin films that serve as diffusion barriers and corrosion-resistant layers in microelectronic circuits.
Tantalum is alloyed with tungsten to significantly increase the tensile strength and creep resistance of the base metal for use in aerospace and chemical processing equipment.
TaW alloys are utilized in high-temperature environments such as rocket engine nozzles and heat exchangers due to their high melting points and structural stability.
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