Aluminum Sulfide, Sputtering Target, 99.99%, 4 inch dia x 0.25 inch th.

Aluminum sulfide is used as a precursor material in the fabrication of sputtering targets for the deposition of sulfide-based thin films in specialized electronic and photovoltaic applications.

Used in the synthesis of ternary and quaternary sulfide semiconductors and as a dopant source in specific compound semiconductor manufacturing processes.