Aluminum Suboxide, Sputtering Target, 99.9%, 3 inch dia x 0.125 inch th.

Aluminum suboxide is utilized as a target material in reactive sputtering processes to create thin films with specific stoichiometric control for barrier layers and optical coatings.

Used as a precursor material to deposit thin films with high refractive indices and controlled transparency in multi-layer optical interference filters.

Aluminum suboxide serves as a specialized evaporation source for physical vapor deposition (PVD) to produce oxygen-deficient alumina films.