Hafnium Boride, Sputtering Target, 99.5%, 4 inch dia x .25 inch th.

Hafnium boride is used as a sputtering target material to create ultra-high temperature ceramic thin films and wear-resistant coatings in microelectronics and aerospace components.

As an ultra-high temperature ceramic (UHTC), hafnium diboride is utilized in the fabrication of components that must maintain structural integrity at temperatures exceeding 2000 °C.

Used in the development of thermal protection systems and propulsion components due to its exceptional thermal stability and resistance to oxidation at extreme temperatures.

Hafnium boride serves as a source material in physical vapor deposition processes to deposit hard, chemically inert protective layers.