Hafnium Carbide, Sputtering Target, 99.5%, 1 inch dia x 0.125 inch th.

Hafnium carbide is one of the most refractory binary compounds known, used in extreme temperature environments such as rocket nozzles and hypersonic vehicle components.

Due to its exceptionally high melting point, it is utilized in high-temperature structural applications and as a component in ultra-high temperature ceramics (UHTCs).

Hafnium carbide is used as a sputtering target material to create hard, wear-resistant, and thermally stable thin films for cutting tools and microelectronic barriers.

It is employed as an evaporation material in physical vapor deposition processes to produce protective coatings that withstand aggressive thermal and chemical environments.