Chemical Name
Hafnium Nitride
Chemical Formula
HfN
Purity
99.5%
Composition
(Zr<0.5%)
Size
3 inch dia x 0.125 inch th.
EINECS Number
247-282-3
Quantity Available
1 pcs
CAS Number
25817-87-2
Status
Stock
Product ID
SPHFN3D3T02N5
Hazmat
Class 4.3, UN2813, PG II
Catalog Number
3730
Description
Comments
Hafnium nitride is used as a sputtering target material to create hard, wear-resistant coatings and diffusion barriers in microelectronic devices.
Used in the semiconductor industry as a high-stability diffusion barrier and as a gate electrode material due to its high thermal stability and suitable work function.
Utilized for its exceptionally high melting point and mechanical hardness in high-temperature structural components and cutting tools.
Applied via physical vapor deposition to create durable optical thin films with specific refractive index requirements.
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